Comparative Studies on Thin Film of Zinc Oxide (ZnO) Deposited by Spray Pyrolysis and RF Sputtering Technique

Abdullahi, S.; Momoh, M.; Moreh, A.U.; Bayawa, A.M.; Abdullahi, M.B.; Atiku, I.

dc.contributor.author	Abdullahi, S.
dc.contributor.author	Momoh, M.
dc.contributor.author	Moreh, A.U.
dc.contributor.author	Bayawa, A.M.
dc.contributor.author	Abdullahi, M.B.
dc.contributor.author	Atiku, I.
dc.date.accessioned	2018-01-29T09:11:14Z
dc.date.available	2018-01-29T09:11:14Z
dc.date.issued	2017
dc.identifier.uri	www.saspublisher.com
dc.identifier.uri	http://hdl.handle.net/123456789/740
dc.description.abstract	Thin films of ZnO were deposited on corning glass (by rf sputtering and spray pyrolysis) and annealed at 573 and 673 K respectively. It has been noted that the samples deposited by Spray pyrolysis have an average transmittance, refractive index and extinction coefficient as 80% to 90%, 1.33 to 1.44 and 13.11 to 27.52 respectively. While those deposited by sputtering method have 34% to 80%, 1.51to 1.58 and 0.11 to 0.37. The XRD patterns of the samples shows that they are polycrystalline. Other optical parameters analyzed include the refractive index (n), absorption coefficient ( ) and the extinction coefficient (k).	en_US
dc.language.iso	en_US	en_US
dc.publisher	Scholars Journal of Engineering and Technology (SJET)	en_US
dc.subject	Department of Physics	en_US
dc.title	Comparative Studies on Thin Film of Zinc Oxide (ZnO) Deposited by Spray Pyrolysis and RF Sputtering Technique	en_US
dc.type	Article	en_US