dc.contributor.author | Abdullahi, S. | |
dc.date.accessioned | 2018-01-29T09:57:48Z | |
dc.date.available | 2018-01-29T09:57:48Z | |
dc.date.issued | 2015 | |
dc.identifier.issn | 2166-0182 | |
dc.identifier.uri | http://hdl.handle.net/123456789/747 | |
dc.description.abstract | Transparent conducting Fluorine tin oxide (FTO) thin films with the thickness of 100nm were deposited on glass substrates via spry pyrolysis technique, and three samples were post-annealed in open air atmosphere for one hour at 423K, 573K and 723K selected temperature points respectively. A four-point probe measurement system was adopted to characterize the FTO thin films. Influence of thermal annealing in air atmosphere on electrical properties was investigated in detail. The sheet resistance reached the minimum of 1.53 × 104 Ω/cm2 for the sample annealed at 423K. It increased dramatically at even higher annealing temperature. | en_US |
dc.language.iso | en_US | en_US |
dc.publisher | International Journal of Nano and Material Sciences | en_US |
dc.subject | Department of Physics | en_US |
dc.title | Electrical Characterization of Fluorine Doped Tin Oxide Deposited by Spray Pyrolysis Technique and Annealed in Open Air | en_US |
dc.type | Article | en_US |