Abstract:
Transparent conducting Fluorine tin oxide (FTO) thin films with the thickness of
100nm were deposited on glass substrates via spry pyrolysis technique, and three samples
were post-annealed in open air atmosphere for one hour at 423K, 573K and 723K selected
temperature points respectively. A four-point probe measurement system was adopted to
characterize the FTO thin films. Influence of thermal annealing in air atmosphere on
electrical properties was investigated in detail. The sheet resistance reached the minimum
of 1.53 × 104 Ω/cm2 for the sample annealed at 423K. It increased dramatically at even
higher annealing temperature.