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Influence of Substrate Temperature on Electrical Resistivity and Surface Morphology of CuAlS2 Thin Films Prepared by Vacuum Thermal Evaporation Method

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dc.contributor.author Moreh, A.U.
dc.contributor.author Momoh, M.
dc.contributor.author Hamza, B.
dc.contributor.author Abdullahi, S.
dc.contributor.author Yahya, H.N.
dc.contributor.author Namadi, S.
dc.contributor.author Umar, S.
dc.date.accessioned 2018-01-29T09:15:30Z
dc.date.available 2018-01-29T09:15:30Z
dc.date.issued 2014
dc.identifier.issn 2166-0182
dc.identifier.uri http://hdl.handle.net/123456789/741
dc.description.abstract In this paper the effect of substrate temperature on electrical and morphological properties of CuAlS2 thin films prepared by two stage vacuum thermal evaporation technique have been studied. The electrical resistivity of the films was studied using four point probe method. The surface morphology was examined by employing Evoma-10 Scanning electron Microscope. The resistivity (  ) of CuAlS2 film is found to decrease with increase in substrate temperature, which is related to the increase of carrier concentration with increase in substrate temperature. Thus films grown at an elevated substrate temperatures exhibit the lowest resistivity and high carrier concentration, implying that these are the most conductive films. Low electrical resistivity and high carrier concentration are widely used as the essential components in various optoelectronic devices and photovoltaic cells. Visual inspection of Scanning electron microscopy (SEM) micrographs of the films showed that crystallite size increase with increase insubstrate temperature en_US
dc.language.iso en_US en_US
dc.publisher International Journal of Nano and Material Sciences en_US
dc.subject Department of Physics en_US
dc.title Influence of Substrate Temperature on Electrical Resistivity and Surface Morphology of CuAlS2 Thin Films Prepared by Vacuum Thermal Evaporation Method en_US
dc.type Article en_US


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